JunPus thermal compounds deliver advanced heat dissipation solutions tailored for high-performance AI chips, CPUs, GPUs, and 5G base stations.
Engineered for cutting-edge semiconductor technologies,
our patented thermal pastes optimize thermal conductivity, ensuring stable performance under intensive workloads. Trusted across electronics, data centers, and telecommunications
JP-DX2 combines nano-diamond powder with silicone-based material for use at the thermal interface.
JunPus concept: mixed particle sizes
Illustrative platelet-shaped filler
Nano-diamond formulation
Nano-diamond powder and silicone-based material.
Electrically non-conductive
A thermal grease option for electronic assemblies.
Syringe application
Apply to the contact area using your hardware’s recommended method.
Thermal-interface illustration.
THE CONTACT LAYER
Made for the contact layer.
JP-DX2 forms the contact layer between the processor surface and cooler base.
Thermal conductivity
How readily a material carries heat.
Bond-line thickness
The final paste-layer thickness between the assembled contact surfaces.
Thermal resistance
The interface’s opposition to heat flow. Conductivity, bond-line thickness and contact quality all affect it.
CONSISTENCY & GPU APPLICATION
From GPU die to heatsink.
Viscosity describes a material’s resistance to flow. JP-DX2 forms a thin thermal-paste layer between the GPU contact surface and a compatible heatsink base.
Heat conduction
GPU die → JP-DX2 contact layer → heatsink.
Airflow
The fan draws air upward through the fins in this layout.
VRAM & VRM
Retain the board maker’s specified thermal pads. Do not replace pad-filled gaps with a thick layer of paste.
Match the application to the GPU board and cooler design.
Illustrative curve
JP-DX2. 60 psi / 0.048.
TEMPERATURE RANGE
Temperature stability. −150 to 350 °C.
Material temperature-stability ranges for JP-DX2 and JP-DX1.
Material temperature stability Temperature · °C
JP-DX2−150 to 350 °C
JP-DX1−50 to 200 °C
−2000200400
HIGH-TEMPERATURE AGING
125 °C × 1,000 h
JP-DX2 high-temperature baking
High-temperature baking exposure: 125 °C for 1,000 hours. Measurement pressures: 15, 30 and 45 psi.
JP-DX2 is a cutting-edge thermally conductive compound designed to meet the rigorous demands of modern AI chips, semiconductors, and high-performance electronics. Made from high-purity thermal conducting materials, its nanoscale-treated molecular structure ensures superior thermal conductivity. Formulated with nanodiamond powder and silicone fluids, JP-DX2 delivers exceptional heat dissipation for applications requiring advanced thermal management.